Electrical and structural properties of Cr ion-implanted thin Au films

dc.contributor.authorArtunc, N
dc.contributor.authorElgun, N
dc.contributor.authorVizir, A
dc.contributor.authorBrown, I
dc.contributor.authorBo, S
dc.contributor.authorTarhan, E
dc.date.accessioned2019-10-27T18:25:25Z
dc.date.available2019-10-27T18:25:25Z
dc.date.issued1999
dc.departmentEge Üniversitesien_US
dc.description.abstractCr metal ions with doses of 1 x 10(14)-1 x 10(15) ions/cm(2) have been implanted at 125 keV into thin Au films prepared by DC magnetron sputtering. Electron diffraction patterns have revealed that ail the films remain in the f.c.c. structure, indicating the formation of Au-Cr solid solution. The resistivity of the films were studied in the temperature range 100-330 K. The results show increase in the resistivity with respect to the unimplanted him as a result of the implantation. Some samples show two different types of resistivity anomalies, which are attributed to the occurrence of the antiferromagnetically incommensurate spin density wave and commensurate spin density wave structures, (C) 1999 Elsevier Science S.A. All rights reserved.en_US
dc.identifier.doi10.1016/S0254-0584(99)00087-5
dc.identifier.endpage187en_US
dc.identifier.issn0254-0584
dc.identifier.issn0254-0584en_US
dc.identifier.issue2en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage182en_US
dc.identifier.urihttps://doi.org/10.1016/S0254-0584(99)00087-5
dc.identifier.urihttps://hdl.handle.net/11454/36297
dc.identifier.volume60en_US
dc.identifier.wosWOS:000081585900010en_US
dc.identifier.wosqualityQ2en_US
dc.indekslendigikaynakScopusen_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.language.isoenen_US
dc.publisherElsevier Science Saen_US
dc.relation.ispartofMaterials Chemistry and Physicsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectmagnetron sputteringen_US
dc.subjection implantationen_US
dc.subjecttransmission electron microscopyen_US
dc.subjectCr ion-implanted Au filmsen_US
dc.subjectstructural and electrical propertiesen_US
dc.titleElectrical and structural properties of Cr ion-implanted thin Au filmsen_US
dc.typeArticleen_US

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